AR-P 3800 high resolution PR for IC

AR-P 3800 high resolution photoresist for IC fabrication

features:

• broadband UV, i-line, g-line
• high sensitivity, highest resolution up to 0.4 µm
• high contrast, excellent dimensional accuracy
• optimised coating properties on topologically complex substrate surfaces
• 3840 coloured to prevent the effect of standing waves
• plasma etching resistant, stable up to 120 °C
• combination of novolac and naphthoquinone diazide
• safer solvent PGMEA
  • AR-P 3840