AR-P 3800 high resolution PR for IC
AR-P 3800 high resolution photoresist for IC fabrication
產品特性:
AR-P 3800 high resolution photoresist for IC fabrication
features:
- broadband UV, i-line, g-line
- high sensitivity, highest resolution up to 0.4 µm
- high contrast, excellent dimensional accuracy
- optimised coating properties on topologically complex substrate surfaces
- 3840 coloured to prevent the effect of standing waves
- plasma etching resistant, stable up to 120 °C
- combination of novolac and naphthoquinone diazide
- safer solvent PGMEA
- AR-P 3840