AR-P 3800 high resolution PR for IC

AR-P 3800 high resolution photoresist for IC fabrication

產品特性:

AR-P 3800 high resolution photoresist for IC fabrication

features:

  • broadband UV, i-line, g-line
  • high sensitivity, highest resolution up to 0.4 µm
  • high contrast, excellent dimensional accuracy
  • optimised coating properties on topologically complex substrate surfaces
  • 3840 coloured to prevent the effect of standing waves
  • plasma etching resistant, stable up to 120 °C
  • combination of novolac and naphthoquinone diazide
  • safer solvent PGMEA
      • AR-P 3840