AR-P 3100 series photoresist for mask
AR-P 3100 series for photomask
產品特性:
AR-P 3100 series for photomask
features:
- broadband UV, i-line, g-line
- high photosensitivity, high resolution
- strong adhesion to critical glass, chromium surfaces for extreme stresses during wet-chemical etching processes
- for the production of CD masters and lattice structures
- 3170 also suitable for laser interference lithography
- plasma etching resistant
- combination of novolac and naphthoquinone diazide
- safer solvent PGMEA
- Product series:
- AR-P 3110
- AR-P 3120
- AR-P 3170
- Product series:
