AR-P 3100 series photoresist for mask

AR-P 3100 series for photomask

產品特性:

AR-P 3100 series for photomask

features:

  • broadband UV, i-line, g-line
  • high photosensitivity, high resolution
  • strong adhesion to critical glass, chromium surfaces for extreme stresses during wet-chemical etching processes
  • for the production of CD masters and lattice structures
  • 3170 also suitable for laser interference lithography
  • plasma etching resistant
  • combination of novolac and naphthoquinone diazide
  • safer solvent PGMEA
    • Product series:
      • AR-P 3110
      • AR-P 3120
      • AR-P 3170