AR-BR 5400 series bottom resist

AR-BR 5400 series bottom layer for 2 layer lift-off process

features:

• bottom resist not light sensitivity
• broadband UV, i-line, g-line for top resist
• for lift-off structures
• for optically transparent structures from 270 nm to IR with thermally stable structures up to 250°C
• aqueous-alkaline development
• temperature-stable up to 140 °C (with AR-P 3500)
• 5400 copolymer methyl methacrylate/methacrylic acid
• safer solvent PM (5400), PGMEA (3500, 4340)
  • Product series:
    • AR-BR 5460
    • AR-BR 5480