AR-BR 5400 series bottom resist
AR-BR 5400 series bottom layer for 2 layer lift-off process
產品特性:
AR-BR 5400 series bottom layer for 2 layer lift-off process
features:
- bottom resist not light sensitivity
- broadband UV, i-line, g-line for top resist
- for lift-off structures
- for optically transparent structures from 270 nm to IR with thermally stable structures up to 250°C
- aqueous-alkaline development
- temperature-stable up to 140 °C (with AR-P 3500)
- 5400 copolymer methyl methacrylate/methacrylic acid
- safer solvent PM (5400), PGMEA (3500, 4340)
- Product series:
- AR-BR 5460
- AR-BR 5480
- Product series: