AR-BR 5400 series bottom resist

AR-BR 5400 series bottom layer for 2 layer lift-off process

產品特性:

AR-BR 5400 series bottom layer for 2 layer lift-off process

features:

  • bottom resist not light sensitivity
  • broadband UV, i-line, g-line for top resist
  • for lift-off structures
  • for optically transparent structures from 270 nm to IR with thermally stable structures up to 250°C
  • aqueous-alkaline development
  • temperature-stable up to 140 °C (with AR-P 3500)
  • 5400 copolymer methyl methacrylate/methacrylic acid
  • safer solvent PM (5400), PGMEA (3500, 4340)
    • Product series:
      • AR-BR 5460
      • AR-BR 5480