SXAR-N 7700/30 high sensitive resist

SXAR-N 7700/30 high sensitive e-Beam resist mix & match with broadband UV

features:

• e-beam, BB-UV
• highest sensitivity, good resolution
• good adhesion properties, high contrast, chemically enhanced
• mix & match processes between e-beam and BB- UV are possible
• plasma etching resistant, very process-stable
• novolac with photosensitive acid generator and aminic cross-linker
• safer solvent PGMEA
• Product series:
  • SXAR-N 7700/30