SXAR-N 7530/1 white light resist

SXAR-N 7530/1 white light e-beam resist for mix & match

產品特性:

SXAR-N 7530/1 white light e-beam resist for mix & match

features:

    • e-beam, middle and deep UV (no yellow light required)
    • short writing times, very high contrast
    • mix & match processes between e-beam and UV exposure 248-290 nm, negative in UV
    • highest resolution, very process-stable (no CAR)
    • plasma etching resistant, temperature-stable up to 140 °C
    • novolac, organic cross-linker
    • safer solvent PGMEA
    • Product series:
      • SXAR-N 7530/1