For mix & match applications in the negative mode, a tempering and flood exposure after the image-wise primary exposure are added as further steps to the procedure which makes the entire process quite complex. The most flexible developer for resist AR-P 7400.23 is AR 300-26. Contrast and development rate can be adjusted to a large degree by dilution of the developer. Developer dilutions of 1 : 3 to 1 : 8 with DI water are possible. In the negative mode, a comparably strong developer (AR 300-26) yields better results. The development time should ideally range between 30 and 60 seconds.