04. high TH layer & special applications
g. Process Instruction
04. high thickness layer & special applications
High layers for special applications
Films with a thickness of up to 800 nm can be produced With AR-P 6200.13, and even 1.5-μm films are possible with experimental sample SX AR-P 6200/10.
AR-P 6200.13: 100-nm trenches in 830-nm thick layer
AR-P 6200 (CSAR 62) is also applied in various two-layer systems and can be used both as bottom and as top resist.
AR-P 6200.09 as top resist for extreme lift-off applications
Another field of application for AR-P 6200 (CSAR 62) is the production of mask blanks which are coated with our resist and offered by our partners:
At a film thickness of 380 nm, 100-nm lines and spaces can be obtained on a chrome mask with AR-P 6200.13. The sensitivity is 12 μC/cm2 (20 kV, AR 600-548).