03. lift-off structures

g. Process Instruction

03. lift-off structures

Lift-off structures

Resist AR-P 6200 (CSAR 62) is well suited to generate lift-off structures with a resolution of up to 10 nm. If the dose is increased by a factor of 1.5 - 2, narrow trenches with defined undercut can be fabricated with AR-P 6200.09.

Undercut structures obtained with increased exposure dose

After vapour-deposition of metal and subsequent easy lift-off, metal structures remain.

19-nm metal lines after lift-off process with AR-P 6200.09

CrAu test structures with a line width of 26 nm