07. development at lower temperature

h. Application Examples

07. development at lower temperature

AR-P 6200 (CSAR 62) – Development at lower temperatures

The sensitivity of CSAR 62 is strongly influenced by the choice of the developer. In comparison to the standard developer AR 600-546, the sensitivity can almost be increased tenfold if AR600-548 is used which is however accompanied by an incipient erosion of unexposed resist areas. This is tolerable to a certain extent: If, for example, always 10 % of the layer is lost, can this effect be compensated for in advance. Erosion can also be avoided if the development is carried out at lower temperatures, but this is again associated with a certain loss of the previously gained sensitivity. It thus comes down to the fact that an optimisation of the process is required. The lower temperatures offer, due to the more gentle development step, the possibility to increase the contrast or reduce the edge roughness.

Fig. 14-16 show the sensitivities and resolutions of AR-P 6200.04 at 6 °C and 21 °C (room temperature). Due to the high contrast at 6 °C, a resolution of 6 nm could be

achieved.

Fig. 14 CSAR 62 structures at 6 °C, opt. dose 195 pC/cm

Fig. 15 CSAR 62 structures at 21 °C, opt. dose 121 pC/cm

Fig. 16 Max. resolution of 6 nm at 235 pC/cm and 6 °C