02. plasmonic nanomaterials

h. Application Examples

02. plasmonic nanomaterials

Fabrication of plasmonic nanomaterials

The working group “Quantum Detection” at the Aarhus University Denmark which has already for many years successfully promoted electron beam projects for nanostructuring emphasised in particular the high process stability of CSAR 62 in comparison with ZEP 520. CSAR 62 is able to balance out small process fluctuations and still reliably provides the desired high resolution. The new Allresist product furthermore showed 1.5-fold higher contrast values than ZEP in comparative measurements (👉Fig. 2).

Fig. 2 Contrast curves AR-P 6200 and ZEP 520A, 50kV, substrate: Si; ZEP 520A, film thickness 220 nm, 60 s ZED N-50, contrast 6; AR-P 6200, film thickness 260 nm, 60 s AR 600-546, contrast 9.