a. Features
a. Features
AR-P 6200系列 高解析度電子束微影阻劑
產品特性:
厚度範圍0.05-1.6um
(轉速6000-1000 rpm, 請參考spin curve).
高敏感度, 可依顯影製程調整.
高解析度(<10 nm/best 6nm), 高對比(14).
製程穩定,耐乾蝕刻製程.
lift-off 結構,製程簡單.
共聚物高分子.
安全溶劑(anisole).
依厚度需求,提供系列產品:
AR-P 6200.04
AR-P 6200.09
AR-P 6200.13
AR-P 6200.18
AR-P 6200 series highest resolution
Features:
layer thickness 0.05-1.6 μm
(6000-1000 rpm)
high sensitivity which can be adjusted via the developer
highest resolution (< 10 nm) and very high contrast
highly process-stable, high plasma etching resistance
easy fabrication of lift-off structures
poly(α-methyl styrene-co-α-chloroacrylate methylester)
safer solvent anisole
based on thickness requirement, product provided:
AR-P 6200.04
AR-P 6200.09
AR-P 6200.13
AR-P 6200.18