a. Features

AR-P 6200系列 高解析度電子束微影阻劑

產品特性:

厚度範圍0.05-1.6um

(轉速6000-1000 rpm, 請參考spin curve).

高敏感度, 可依顯影製程調整.

高解析度(<10 nm/best 6nm), 高對比(14).

製程穩定,耐乾蝕刻製程.

lift-off 結構,製程簡單.

共聚物高分子.

安全溶劑(anisole).

依厚度需求,提供系列產品:

AR-P 6200.04

AR-P 6200.09

AR-P 6200.13

AR-P 6200.18

AR-P 6200 series highest resolution

Features:

layer thickness 0.05-1.6 μm

(6000-1000 rpm)

high sensitivity which can be adjusted via the developer

highest resolution (< 10 nm) and very high contrast

highly process-stable, high plasma etching resistance

easy fabrication of lift-off structures

poly(α-methyl styrene-co-α-chloroacrylate methylester)

safer solvent anisole

based on thickness requirement, product provided:

AR-P 6200.04

AR-P 6200.09

AR-P 6200.13

AR-P 6200.18