AR-P 617 features

AR-P 610 copolymer e-Beam resist

產品特性:

    • 適合電子束微影, 深紫外線(248 nm)
    • 高解析度(10nm), 高對比.
    • 對玻璃, 矽及金屬等基材有良好的接著性.
    • 相較於PMMA阻劑, 敏感度可高出3-4倍.
    • 敏感性能可透過軟考(soft-bake)調整.
    • 應用於平坦化及立體結構積層電路.
    • 耐溫240℃.
    • 使用MMA-co-MA共聚物.
    • 使用PGME安全性較高溶劑.
    • 產品系列:
      • AR-P 617.03
      • AR-P 617.06
      • AR-P 617.08

AR-P 610 copolymer e-Beam resist

features:

    • e-beam, deep UV (248 nm)
    • highest resolution, high contrast
    • strong adhesion to glass, silicon and metals
    • 3-4 times more sensitive than PMMA
    • sensitivity can be adjusted via the softbake
    • for planarization and multi-layer processes
    • temperature-stable up to 240 °C
    • copolymer on the basis of methyl methacrylate and methacrylic acid
    • safer solvent 1-methoxy-2-propanol
    • Product series:
      • AR-P 617.03
      • AR-P 617.06
      • AR-P 617.08