AR-N 7520-new series - mix & match

AR-N 7520-new e-Beam resist for mix & match - 產品特性:

AR-N 7520-new e-Beam resist for mix & match - features:

    • e-beam, deep UV, i-line (formerly SX AR-N 7520/4)
    • short writing times, very high contrast
    • mix & match processes between e-beam and UV exposure 248-365 nm,
    • negative in the UV range
    • highest resolution, very process-stable (no CAR)
    • plasma etching resistant, temp.-stable up to 140 °C
    • novolac, organic crosslinking agent
    • safer solvent PGMEA
    • Product series:
      • AR-N 7520.07
      • AR-N 7520.11
      • AR-N 7520.17