AR-N 7520 series - mix & match

AR-N 7520 e-Beam resist for mix & match

產品特性:

AR-N 7520 e-Beam resist for mix & match

features:

  • e-beam, deep UV, i-line
    • very high contrast, excellent transfer of structures, high-precision edges
    • mix & match processes between e-beam and UV exposure 248-365 nm
    • highest resolution, very process-stable (no CAR)
    • plasma etching resistant, temp.-stable up to 140 °C
    • novolac, organic cross-linking agent
    • safer solvent PGMEA
    • Product series:
      • AR-N 7520.073
      • AR-N 7520.18