AR-N 7500 series - mix & match

AR-N 7500 series e-Beam resist for mix & match - 產品特性:

AR-N 7500 e-Beam resist for mix & match - features:

    • e-beam, deep UV, i-line, g-line
    • intermediate sensitivity
    • mix & match-processes between e-beam and UV exposure 310 - 450 nm, positive or negative depending on the exposure wavelength chosen
    • high resolution, process-stable (no CAR)
    • plasma etching resistant, temperature stable up to 120 °C
    • novolac, naphthoquin. diazide, organic crosslink agent
    • safer solvent PGMEA
    • Product series:
      • AR-N 7500.08
      • AR-N 7500.18