7. Customer-specific technologies
7. customer-specific technologies
The generation of semiconductor properties: the produced resist mask is utilised for technological processes according to the user’s requirements. Semiconductor properties are generated in a user specific manner, e.g. by boron or phosphorous doping, by etch processes or by formation of conductor paths. Thereafter, the resist is in most cases no longer needed and removed. In a few cases, the resist structures are utilised as actual function on the component and thus remain on the substrate.