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歡迎光臨
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前瞻製程解決方案
Product and Service
tSPL resist
熱掃描微影阻劑
熱掃描微影阻劑
Conductive Coating
導電塗佈
導電塗佈
Photoresist
光阻
光阻
AR-P 1200 series (positive spray PR)
AR-P 3100 series (adhesion enhanced PR)
AR-P 3200 series (PR for electro-plating)
AR-P 3500 (T) series (std positive PR)
AR-P 5300 series (positive PR for lift-off)
SX AR-P 3500/8 (high temperature stable PR)
AR-N 2200 series (negative spray PR)
AR-N 4340 (std negative CAR PR for IC)
AR-N 4400 series (thick negative PR)
Bottom resist for lift-off
底層阻劑
底層阻劑
Lithography process chemicals
微影製程化學品
Adhesion promoter
增黏劑
增黏劑
Developer
顯影劑
顯影劑
AR 300-44 metal ion-free developer
AR 300-46 metal ion-free developer
AR 300-47 metal ion-free developer
AR 300-475 metal ion-free developer
AR 600-50 ultra pure developer for e-beam resist
AR 600-51 ultra pure developer for e-beam resist
AR 600-55 ultra pure developer for e-beam resist
AR 600-56 ultra pure developer for e-beam resist
AR 600-57 MIBK-free developer for PMMA resist
AR 600-546 weaker developer for CSAR 62
AR 600-548 strong developer for CSAR 62